Thin Film Materials Scientist (TE-VSC-SCC-2026-133-GRAP)

Deposit superconductive (thin) films onto various copper substrates (1.3 GHz, 400 MHz, 800 MHz cavities) via HiPIMS. Perform plasma-based surface treatment for cleaning and surface passivation/functionalisation. Perform in situ plasma diagnostics for process R&D; (e.g. mass spectrometry, OES, Langmuir probe). Perform materials characterisation and data analysis (e.g. SEM, XRD, XRF, profilometry). Investigate the use of a dielectric barrier as a method for suppressing thermoelectric currents. Commission and operate a movable cathode sputtering system for 1.3 GHz cavities. Contribute to the design of new sputtering systems. Prepare coating systems within a cleanroom environment.

The Vacuum, Surfaces and Coatings (VSC) Group within CERN's Technology (TE) Department is responsible for the full lifecycle of accelerator vacuum systems, from development and design through to installation, operation and maintenance. The group operates facilities for measuring vacuum performance, assessing the compatibility of materials and surface technologies, and performing thin film coating, surface finishing, and vacuum-related physical and chemical characterisation. As part of this group, you will join the Surface Coating and Chemistry (SCC) section, which provides CERN-wide expertise and services in wet surface treatments, surface and chemical analysis, and surface coating using physical vapour deposition techniques. In this role, you will contribute to the development of coating systems, thin-film materials and plasma-based surface treatments, with a particular focus on applications related to superconducting radiofrequency (SRF) cavities and adjacent technologies.

• Practical laboratory experience in plasma-based thin film deposition, particularly HiPIMS.

• Practical experience working with UHV systems.

• Planning and executing experimental work, troubleshooting equipment or process issues, and analysing characterisation data to support coating development and optimisation.

• Preparing technical procedures, documenting experimental methods and results, and contributing to safe, reproducible laboratory practices.

• Working in a dynamic technical environment.

• Participating in technical meetings, seminars, and project discussions, sharing findings and communicating technical information within and outside the organisation.

• Using plasma diagnostic techniques in the context of thin film fabrication would be an advantage.

• Experience working in a cleanroom would be an advantage.

• Experience performing Rietveld refinement would be an advantage.